Ion Implantation into Semiconductors, Oxides and Ceramics

Ion Implantation into Semiconductors, Oxides and Ceramics

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Elsevier Science & Technology
EAN: 9780080436135
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Detailed information

These proceedings contain the reviewed papers presented at the Symposium J on "Ion Implantation into Semiconductors, Oxides and Ceramics", which was held at the Spring Meeting of the European Materials Research Society in Strasbourg, France, 16-19, June 1998. The symposium attracted 110 contributions, with authors from 31 nations in 5 continents. It was thereby the largest in a series of E-MRS ion beam symposia, documenting the importance of ion beam techniques and research in this area. The aim of this symposium was to provide a forum for the discussion of new results in the implantation of materials from three different classes: semiconductors, oxides and ceramics.
EAN 9780080436135
ISBN 0080436137
Binding Hardback
Publisher Elsevier Science & Technology
Publication date March 1, 1999
Pages 454
Language English
Dimensions 279 x 210
Country United Kingdom
Illustrations index
Editors Svensson B.G.
Series European Materials Research Society Symposia Proceedings
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